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Dezember 2021

WORKSHOP: ALD for Industry 2021

Dezember 1 - Dezember 2

5th Workshop, Tutorial & Exhibition after four successful events we are looking forward to the next ALD Meeting. Atomic Layer Deposition (ALD) is used to deposit ultraconformal thin films with sub-nm film thickness control. The method is unique in the sense that it em­ploys sequential self-limiting surface reactions for growth in the monolayer thickness regime. Today, ALD is a key technology in leading edge semiconductor technology and the field of application in other industries is increasing rapidly. According to market…

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