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ALD for Industry – 3rd Workshop and Tutorial

März 19, 2019 - März 20, 2019

Including Industrial Exhibition and Practical ALD Show

A topical workshop with focus on industrialization and commercialization of ALD for current and emerging markets

Atomic Layer Deposition (ALD) is used to deposit ultraconformal thin films with sub-nm film thickness control. The method is unique in the sense that it employs sequential self-limiting surface reactions for growth in the monolayer thickness regime. Today, ALD is a key technology in leading semiconductor technology and the field of application in other leading-edge industries is increasing rapidly. According to market estimates the equipment market alone is currently at an annual revenue of US$ 1.5-1.7 billion (2017) and it is expected to double in the next 4-5 years.

In a European context ALD was invented independently twice in Europe (Russia & Finland) and since the last 15 years Germany has grown to become one of the strongest European markets for ALD in R&D, chemicals, equipment and end users.

The Event will focus on the current markets for ALD and addresses the applications in semiconductor industry, MEMS & Sensors, Battery Technology, Medical, Display, Lightning, Barriers and Photovoltaics.



ALD for Industry: 790,00 EUR
Tutorial only: 390,00 EUR
Workshop only: 590,00 EUR

The registration fee includes the participation of the choosen event, conference proceedings, coffee and lunch breaks and the social evening.

Platinum Sponsors

Gold Sponsors



März 19, 2019
März 20, 2019


Fraunhofer-Forum Berlin
Anna-Louisa-Karsch-Straße 2
Berlin, 10178
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