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ALD for Industry – 3rd Workshop and Tutorial

März 19 - März 20

Including Industrial Exhibition and Practical ALD Show

A topical workshop with focus on industrialization and commercialization of ALD for current and emerging markets

Atomic Layer Deposition (ALD) is used to deposit ultraconformal thin films with sub-nm film thickness control. The method is unique in the sense that it employs sequential self-limiting surface reactions for growth in the monolayer thickness regime. Today, ALD is a key technology in leading semiconductor technology and the field of application in other leading-edge industries is increasing rapidly. According to market estimates the equipment market alone is currently at an annual revenue of US$ 1.5-1.7 billion (2017) and it is expected to double in the next 4-5 years.

In a European context ALD was invented independently twice in Europe (Russia & Finland) and since the last 15 years Germany has grown to become one of the strongest European markets for ALD in R&D, chemicals, equipment and end users.

The Event will focus on the current markets for ALD and addresses the applications in semiconductor industry, MEMS & Sensors, Battery Technology, Medical, Display, Lightning, Barriers and Photovoltaics.

Program

Fees:

ALD for Industry: 790,00 EUR
Tutorial only: 390,00 EUR
Workshop only: 590,00 EUR

The registration fee includes the participation of the choosen event, conference proceedings, coffee and lunch breaks and the social evening.

Platinum Sponsors

Gold Sponsors

Co-Organizer

Details

Beginn:
März 19
Ende:
März 20
Veranstaltungskategorie:

Veranstaltungsort

Fraunhofer-Forum Berlin
Anna-Louisa-Karsch-Straße 2
Berlin, 10178
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