Anstehende Veranstaltungen

5th Workshop, Tutorial & Exhibition after four successful events we are looking forward to the next ALD Meeting. Atomic Layer Deposition (ALD) is used to deposit ultraconformal thin films with sub-nm film thickness control. The method is unique in the sense that it em­ploys sequential self-limiting surface reactions for growth in the monolayer thickness regime. Today, ALD is a key technology in leading edge semiconductor technology and the field of application in other industries is increasing rapidly. According to market…