SENTECH Instruments GmbH



  • Thin film measurement equipment
  • Construction of deposition and plasma treatment plant

Member since: 2006

SENTECH Instruments GmbH

Schwarzschildstr. 2
12489 Berlin (Germany)

+49 30 63 92 55 20

+49 30 63 92 55 22



SENTECH Instruments develops, manufactures, and globally sells innovative capital equipment centered on thin films in semiconductor technology, microsystems, photovoltaics, nanotechnology and materials research. SENTECH is expert in structuring and deposition of thin films by means of plasma process technology. SENTECH offers systems for plasma etching, plasma enhanced chemical vapour deposition, and atomic layer deposition. SENTECH provides innovative solutions for non-contact, non-invasive optical characterization using ellipsometry and reflectometry. Founded in 1990, SENTECH is a reliable partner to industry and scientific institutions with leading edge equipment, global sales and service network.

SENTECH’s motto “Erfolg durch Leistung” is a continuing commitment of all employees to achieve success by high standard of efficiency and customer service.

Plasma process technology

  • Inductively Coupled Plasma (ICP) etch of silicon, quartz, and dielectrics
  • Plasma Etch using Capacitively Coupled Plasma (CCP) sources
  • Deep Reactive Ion Etching (DRIE)
  • Inductively Coupled Plasma Enhanced Chemical Vapour Deposition (ICPECVD)
  • Thermal and Plasma Enhanced Atomic Layer Deposition (PEALD)

Thin Film Metrology:

  • Spectroscopic ellipsometry
  • Laser ellipsometry
  • Reflectometry


In 1990, SENTECH was founded in Adlershof, Berlin with a sales department in Munich. As part of the business campus Adlershof, Berlin, SENTECH continuously grew with its product portfolio, sales and service network. In 2010, SENTECH expanded to our own premises in Adlershof, Berlin. In 2015, SENTECH is going to extend its production capacity with an expansion meeting the continuous growing demand for innovative instrumentation. Completing SENTECH’s sales department, SENTECH has world-wide sales and support network with distributors and representatives.

Milestones in plasma process technology:

  • First Planar Triple Spiral Antenna (PTSA) plasma source for plasma etching and deposition
  • First high throughput etch cluster for glass wafers
  • First Plasma Enhanced Atomic Layer Deposition (ALD) system

Milestones in thin film metrology:

  • First Combined Ellipsometry and Reflectometry (CER) Ellipsometer
  • First SENDIRA, FTIR ellipsometer
  • First ellipsometric measurement on textured Si-wafer in photovoltaics